Schaeffler India

 
 
 
 
 
 
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Lithography

High precision linear guidance systems for X-Y co-ordinate tables

In order to apply structures to the chips, these are coated with an extremely light-sensitive photographic lacquer. The photographic lacquer is exposed through a mask and decomposes where light falls.

In the next generation of semiconductor production, the aim will be to produce structures less than 60 nm in size in order to achieve higher storage densities and switching speeds.

Co-ordinate X-Y tables driven by linear motors move the substrate and projection mask. The machine is based on a rigid, vibration-damped granite bed and a high precision guidance system, for example the INA linear roller bearing and guideway assembly RUE. This extremely low-noise guidance system is characterised by uniform running and displacement resistance – for high reproducibility and and accuracy in positioning.